Panoramic Technology specializes in developing FullChip® Lithography Engineering Software for R&D and production, offering services such as OPC/Litho Simulation/Verification, High Performance Pattern Matching, Layout Database Server/Viewer Client GUI, and Compact Resist Model calibration. They provide solutions for 3D Mask Effects, Hot Spot Detection, SRAF placement, Retargeting, Dummy Fill, and Multiple Patterning Decomposition. The company also introduces TRIG, a fast and rigorous 3D Maxwell solver for EUV and DUV lithography, along with SEM simulators, resist models, and source optimization tools. Panoramic Technology focuses on advanced lithography simulation and offers a range of software solutions for lithography research and production.